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NIL (NanoImprint Lithography) Polymers
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NanoImprint lithography (NIL), first introduced by Stephen Y. Chou et al. in 1995, is a low-cost, high throughput alternative lithographic technology that defines patterns by mechanical deformation of a polymer on the sub-100 nanometre scale.
It is characterized by parallel patterning across the whole wafer and is well suited for mass production of nano-structures.
In December 2003, NIL was included in the International Technology Roadmap for Semiconductors (ITRS) as a next-generation lithography alternative to be employed at the 35 nm node.
A number of potential applications have been proposed for NIL including nano-electronics, optics, high density storage, nano-magnetic devices, nano-fluidics, nano-electromechanical elements, bio-devices, and transducers.
Polymers are one of the keys to NanoImprint lithography (NIL).
Micro resist technology (GmbH)
have undertaken a lot of research and development within
this field and are now able to offer the following polymers for this emerging market.
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Thermoplastic
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Key Points:
- Standard polymer solutions for 100, 200 & 300nm films.
- Imprint temperature above the Tg.
- Smallest pattern size ~ 50nm : depending on stamp design.
- Plasma etch resistance of mr-I 7000/8000 superior than PMMA. Selectivity
in CHF3 is > 2.
- Preferred as etch mask (single polymer layer process).
- Customized solutions for various thicknesses are available.
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Thermoset
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- Main constituents are a thermocurable pre-polymer and a mixture of
solvents.
- Ready-to-use polymer solution designed for nano-imprint lithography.
- Imprint temperatures <160°C, imprint pressures < 100 bar.
- Thermal stability up to 200°C.
- High resistance to chemicals & plasma etch resistance superior
to PMMA. Selectivity inCHF3 is > 2.
- Suitable for permanent applications.
- Suitable for low cost polymer stamp fabrication.
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